Publications
Google Scholar, ORCID, ResearchGate. EndNote.
Research Contributions
*Denotes equal contribution and co-first authorship
Journal Articles [1–13] (as of April 2026)
[13] Z. Pei*, S. Lu*, L. Shang, S. Jung, Q. Liang, and C. Pan, “Graphene-based interconnect exploration for FPGA design and optimization towards the end of the roadmap,” ACM Transactions on Design Automation of Electronic Systems, 2026. DOI: 10.1145/3810248
[12] Z. Pei, H.-H. Liu, M. Mayahinia, M. Tahoori, F. Catthoor, Z. Tokei, P. Dubey, and C. Pan, “Interconnect/Memory Co-Design and Co-Optimization Using Differential Transmission Lines,” IEEE Transactions on Very Large Scale Integration (VLSI) Systems, 2025. DOI: 10.1109/TVLSI.2025.3595818
[11] Z. Pei, H.-H. Liu, M. Mayahinia, M. B. Tahoori, F. Catthoor, Z. Tőkei, D. B. Abdi, J. Myers, and C. Pan, “Ultra-Scaled E-Tree-Based SRAM Design and Optimization With Interconnect Focus,” IEEE Transactions on Circuits and Systems I: Regular Papers, 2024. DOI: 10.1109/TCSI.2024.3438164
[10] Z. Pei, M. Mayahinia, H.-H. Liu, M. Tahoori, F. Catthoor, Z. Tokei, and C. Pan, “Graphene-Based Interconnect Exploration for Large SRAM Caches for Ultrascaled Technology Nodes,” IEEE Transactions on Electron Devices, vol. 70, pp. 230-238, 2022. DOI: 10.1109/TED.2022.3225512
[9] Z. Pei, F. Catthoor, Z. Tokei, and C. Pan, “Beyond-Cu Intermediate-Length Interconnect Exploration for SRAM Application,” IEEE Transactions on Nanotechnology, 2022. DOI: 10.1109/TNANO.2022.3157952
[8] Z. Pei, A. Dutta, L. Shang, S. Jung, and C. Pan, “Interconnect Technology/System Co-Optimization for Low-Power VLSI Applications Using Ballistic Materials,” IEEE Transactions on Electron Devices, vol. 68, pp. 3513-3519, 2021. DOI: 10.1109/TED.2021.3077210
[7] Z. Pei, L. Shang, S. Jung, and C. Pan, “Deep Pipeline Circuit for Low-Power Spintronic Devices,” IEEE Transactions on Electron Devices, vol. 68, pp. 1962-1968, 2021. DOI: 10.1109/TED.2021.3059601
[6] M. Mayahinia, T. Marinelli, Z. Pei, H.-H. Liu, C. Pan, Z. Tőkei, F. Catthoor, M.B. Tahoori, “System Scenario-based Design of the Last-Level Cache in Advanced Interconnect-Dominant Technology Nodes,” ACM Transactions on Embedded Computing Systems (TECS), 2025. DOI: 10.1145/3762649
[5] H.-H. Liu, C. Gilardi, S. M. Salahuddin, Z. Pei, P. Schuddinck, Y. Xiang, P. Weckx, G. Hellings, M. G. Bardon, and J. Ryckaert, “Future Design Direction for SRAM Data Array: Hierarchical Subarray With Active Interconnect,” IEEE Transactions on Circuits and Systems I: Regular Papers, 2024. DOI: 10.1109/TCSI.2024.3410518
[4] M. Mayahinia, T. Marinelli, Z. Pei, H.-H. Liu, C. Pan, Z. Tokei, F. Catthoor, and M. B. Tahoori, “Dynamic Segmented Bus for Energy-Efficient Last-Level Cache in Advanced Interconnect-Dominant Nodes,” IEEE Embedded Systems Letters, vol. 16, pp. 321-324, 2024. DOI: 10.1109/LES.2024.3444711
[3] H.-H. Liu, P. Schuddinck, Z. Pei, L. Verschueren, H. Mertens, S. M. Salahuddin, G. Hiblot, Y. Xiang, B. T. Chan, and S. Subramanian, “CFET SRAM With Double-Sided Interconnect Design and DTCO Benchmark,” IEEE Transactions on Electron Devices, 2023. DOI: 10.1109/TED.2023.3305322
[2] Y. Yuan, M. Du, S. Zhang, and Z. Pei, “Effects of BiNbO4 on the microstructure and dielectric properties of BaTiO3-based ceramics,” Journal of Materials Science: Materials in Electronics, vol. 20, pp. 157-162, 2009. DOI: 10.1007/s10854-008-9674-5
[1] Z. Pei, Y. Yuan, S. Zhang, and B. Li, “Studies on Fabrication and Properties of High Temperature Ceramic Capacitors Sintered at Intermediate Temperature,” Materials Reports: Special Issue on Nanomaterials and New Materials, issue 1, pp. 366–369, 2009. DOI: 10.3321/j.issn:1005-023X.2009.z1.108
Conference Proceedings [14–19] (as of May 2026)
[19] Z. Pei*, S. Z. Riam*, K. Mooney, C. Pan, N. Gong, and J. Wang, “Reliability-Driven Sneak Path Current Modeling and Optimization for Passive Memristor Crossbar Arrays,” in Proceedings of the Great Lakes Symposium on VLSI 2026, 2026. DOI: 10.1145/3787109.3815222.
[18] Z. Pei, M. Mayahinia, H.-H. Liu, M. Tahoori, F. Catthoor, Z. Tokei, and C. Pan, “Technology/Memory Co-Design and Co-Optimization Using E-Tree Interconnect,” in Proceedings of the Great Lakes Symposium on VLSI 2023, 2023, pp. 159-162. DOI: 10.1145/3583781.3590311
[17] Z. Pei, M. Mayahinia, H.-H. Liu, M. Tahoori, S. M. Salahuddin, F. Catthoor, Z. Tokei, and C. Pan, “Emerging Interconnect Exploration for SRAM Application Using Nonconventional H-Tree and Center-Pin Access,” in 2023 24th International Symposium on Quality Electronic Design (ISQED), 2023, pp. 1-1. DOI: 10.1109/ISQED57927.2023.10129316
[16] S. Lu, Z. Pei, L. Shang, S. Jung, Q. Liang, and C. Pan, “Graphene-Based FPGA Design and Optimization at the 7nm FinFET Technology Node,” in 2025 26th International Symposium on Quality Electronic Design (ISQED), 2025, pp. 1-7. DOI: 10.1109/ISQED65160.2025.11014392
[15] S. Lu, Z. Pei, L. Shang, S. Jung, and C. Pan, “A Technology/Circuit Co-design Framework for Emerging Reconfigurable Devices,” in 2023 IEEE 66th International Midwest Symposium on Circuits and Systems (MWSCAS), 2023, pp. 1123-1127. DOI: 10.1109/MWSCAS57524.2023.10406005
[14] G. Jalilvand, O. Ahmed, K. Bosworth, C. Fitzgerald, Z. Pei, and T. Jaing, “Application of a metallic cap layer to control Cu TSV extrusion,” in 2017 IEEE 67th Electronic Components and Technology Conference (ECTC), 2017, pp. 61-66. DOI: 10.1109/ECTC.2017.290
Acknowledged as a key contributor to the research for the book below:
Circuit-Technology Co-Optimization of SRAM Design in Advanced CMOS Nodes
H.-H. Liu and F. Catthoor, “Circuit-Technology Co-Optimization of SRAM Design in Advanced CMOS Nodes,” Springer, 2024. DOI: 10.1007/978-3-031-76109-6
| IEEE Journal | TCAS-I | TED | TVLSI | TNANO |
| 2025/08–2026/06 Ranking* | Computer Hardware Design: 2 | Microelectronics: 2 | Computer Hardware Design: 10 | — |
| 2025/08–2026/06 Impact Factor | 5.2 | 3.2 | 3.1 | 2.5 |
| 2025/02–05 Ranking* | Computer Hardware Design: 3 | Microelectronics: 2 | Computer Hardware Design: 10 | — |
| 2025/02–05 Impact Factor | 5.2 | 2.9 | 2.8 | 2.1 |
*Google Scholar ranking of journals or conferences in the following 2 categories:
h5-index is the h-index for articles published in the last 5 complete years. It is the largest number h such that h articles published in 2019–2023 (2025/02–05 Ranking) → 2020–2024 (2025/08–2026/06 Ranking) have at least h citations each.
h5-median for a publication is the median number of citations for the articles that make up its h5-index.
ACM Primary Article Template, Linux Libertine font. Pandoc.
ACM TODAES
ACM ICONS
IOP Neuromorphic Computing and Engineering
IEEE TCDS
IEEE JETCAS
IEEE ISCAS
Elsevier Applied Materials Today
Elsevier Materials Today Chemistry
ACM/IEEE Great Lakes Symposium on VLSI (GLSVLSI)
IEEE International Symposium on Quality Electronic Design (ISQED)
ACM Transactions on Embedded Computing Systems (TECS), CODES+ISSS 2025
IEEE Embedded System Letters (ESL), CODES+ISSS 2024
IEEE Midwest Symposium on Circuits and Systems (MWSCAS), 2023
IEEE Electronic Components and Technology Conference (ECTC)
Interuniversitair Micro-Electronica Centrum VZW
Ph.D. in Electrical Engineering dissertation: “Emerging Energy-efficient Scalable Interconnect Design for VLSI Logic and Memory Applications”.
Official digital Ph.D. diploma in Electrical Engineering
A glimpse of our academic lineage, honoring the mentors who shaped our research journey:
- James Donald Meindl (Microelectronics)
- ↳ Azad J Naeemi (Nanoelectronics)